Improving Metal-Semiconductor Contact Conductancewith Patterned Interface of Square-Hole Array
博士 === 國立臺灣大學 === 電子工程學研究所 === 100 === A well-patterned metal-semiconductor interface with square-hole array on a semiconductor substrate, fabricated by electron-beam lithography, is used to improve metal-semiconductor-contact conductance (MSCC) by tuning Schottky barrier through designing arrayed n...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/47131680192410005358 |