Design and Implementation of CMOS-MEMS Tri-axis Accelerometers Using Metal Wet-etching Process
博士 === 國立清華大學 === 奈米工程與微系統研究所 === 100 === This thesis based on the standard CMOS process and post CMOS metal wet-etching process to design and implement 3-axis CMOS-MEMS accelerometers. Typical CMOS-MEMS devices in academia typically adopted dry-etching process for structure geometry define and rele...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2012
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| Online Access: | http://ndltd.ncl.edu.tw/handle/88646509467116682522 |