Characterization of Structure and Mechanical Properties of TiZrN Thin Films Deposited by DC Unbalanced Magnetron Sputtering: Effect of Nitrogen Flow Rate

碩士 === 國立清華大學 === 工程與系統科學系 === 100 === Nanocrystalline TiZrN thin films were deposited on Si (001) substrates by unbalanced magnetron sputtering. The objective of the study is to investigate the effect of nitrogen flow rate on the structure and properties of the TiZrN films with nitrogen flow rangin...

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Bibliographic Details
Main Author: 盧佳暐
Other Authors: 喻冀平
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/87894822548697040058