Using Surface Plasmon Resonance to Measure Filling Defects and Residual Layer Thickness in Nano-imprint Lithography
博士 === 國立清華大學 === 動力機械工程學系 === 100 === When the dimension of the microelectronic structure decreases, high manufacturing cost is inevitable. A low-cost manufacturing technique for nanostructures is desired. Nano-imprint lithography (NIL) has the potential to meet the expectations. Nano-imprint litho...
Main Authors: | Hsu, Wei-Hsuan, 徐偉軒 |
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Other Authors: | Hocheng, Hong |
Format: | Others |
Language: | en_US |
Published: |
2012
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Online Access: | http://ndltd.ncl.edu.tw/handle/03773315672975658715 |
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