Using Surface Plasmon Resonance to Measure Filling Defects and Residual Layer Thickness in Nano-imprint Lithography

博士 === 國立清華大學 === 動力機械工程學系 === 100 === When the dimension of the microelectronic structure decreases, high manufacturing cost is inevitable. A low-cost manufacturing technique for nanostructures is desired. Nano-imprint lithography (NIL) has the potential to meet the expectations. Nano-imprint litho...

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Bibliographic Details
Main Authors: Hsu, Wei-Hsuan, 徐偉軒
Other Authors: Hocheng, Hong
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/03773315672975658715