| Summary: | 碩士 === 國立中山大學 === 光電工程學系研究所 === 100 === In this thesis, we fabricate the quantum dots (QDs) micro-pillar of metal-coated by E-beam lithography, and analyze the optical and electrical properties of micro-pillar cavity devices. For the sample materials, we use S-K mode to grow 3-layer In0.75Ga0.25As QDs structures sandwiched by up and down Al0.5Ga0.5As cladding layer on GaAs substrate by molecular-beam epitaxy (MBE). 40nm GaAs spacer layers with 2nm p-modulation doping in the central barrier are adopted in this study.
The micro-pillar with diameter of 2 m, metal coated on top (p-type) and down (n-type) facet are designed. The good reflectivities of metal contacts provide more energy extraction inside the cavity. We expect the device lasing while the current injection.
First, we design the morphology and size of patterns by AutoCAD software. Then, we use e-beam lithography with proper exposure condition to define the patterns, and thermal evaporation to deposit metals. The superfluous metal is lifted off and the defined area metal is served as dry etching mask to transfer the pattern to the dielectric layer and epi-layer. Finally, we use SiO2 layer to prevent current leakage, and the p-n contact on each facet to complete the devices. Micro-pillar samples with/without metal coated are analyzed by micro-PL system. The emission wavelength of 1282nm and the calculated Q-value of 100 are obtained for the sample with metal coated, an increase of 500%. From the EL measurement results, the device of micro-pillar samples with metal coated generate three peaks, 1149nm, 1221nm and 1291nm. Besides, it can efficiently improve the emission intensities. The measured result matched the simulation result.
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