| Summary: | 碩士 === 國立中山大學 === 材料與光電科學學系研究所 === 100 === In this thesis, the growth of nonpolar m-plane zinc oxide (ZnO) nano-materials on (100) γ–LiAlO2 (LAO) substrates by a chemical vapor deposition (CVD) process had been studied. The mixture powders of ZnO and graphite are used as the precursor of reaction sources. Ar/O2 are used as the carrier gas and reaction gas source respectively, and the Au thin-film coated on the LAO substrate is the catalyst for the vapor-liquid-solid (VLS) growth mode.
The X-ray diffraction (XRD), scanning electron microscope (SEM) and transmission electron microscope (TEM) were used to study the influence of the varied growth conditions, such as deposition time, reaction pressure, growth temperature, and the distance between substrates and reaction powder … etc., on the crystal structure, surface morphology, orientation and microstructure characterizations of the ZnO nanostructure.
The pure (10-10) m-plane ZnO nano-materials can be obtained at the growth parameters of 830°C, 10 torr, 5 minutes, and 50 sccm of Ar/O2.
Furthermore, photoluminescence (PL), cathodoluminescence (CL) and Raman spectroscope (Raman) were used to study optical properties and the inner stress of the materials.
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