Study of thin gate dielectrics on silicon and germanium MOSFETs
博士 === 國立交通大學 === 光電工程學系 === 100 === This work focuses on characterization of thin gate dielectrics on silicon (Si) and germanium-based (Ge-based) metal-oxide-semiconductor field-effect transistor (MOSFET). First, the impacts of nitrogen profile (N profile) and stress memorization technique (SMT) on...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/53543617510083124610 |