Fabrication of sealed microchannels by permeated and double-side partial exposure method
碩士 === 國立交通大學 === 機械工程學系 === 100 === A novel process was proposed to fabricate sealed micro channels by using negative photoresist SU-8, preciously in our lab, which needs only single-layer coating of and double-side partial exposure to have non-uniform inside cross section. However SU-8 cross-l...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/84747042344657634176 |