Micro optical spot measurement system fabricated by CMOS-MEMS technology using dry etching post process
碩士 === 國立交通大學 === 電控工程研究所 === 100 === As the development of data storage systems, micro optical filed measurement becomes more important. In conventional far-field optics, the micro spot size cannot be acquired easily. The resolution is limited by the pixel size. For near-field measurement, near-fie...
| Main Authors: | , |
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| Format: | Others |
| Language: | en_US |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/04659658036620410485 |