Defect Passivation by Nanospheres Using H3PO4 and KOH Etching for UV LED

碩士 === 國立交通大學 === 光電系統研究所 === 100 === In this thesis, we compared defect passivation process by using H3PO4 and KOH etching solution. We observed GaN etching morphology.The H3PO4 prefer to etch screw type dislocation which is treated as non-radiative centers. On the other hand, KOH prefer to attack...

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Bibliographic Details
Main Authors: Ma, Ying-Tsung, 馬印聰
Other Authors: Lin, Chien-Chung
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/06276536655924809868

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