Study of liquid crystal alignment based on periodic nano-wedgy structures via nano-imprint lithography

• Main Authors: Tse-JenWang, 汪澤仁
• Other Authors: Chun-Hung Lin
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/40263816512483897213

碩士 === 國立成功大學 === 光電科學與工程學系 === 100 === In this study, we used the nanoimprint lithography (NIL) to fabricate the periodic nano-wedges groove for vertical alignment. The incline slope from nano-wedges can control LC raising-up direction on applied voltage. The periodic triangle structure was made on silicon wafer by Electron beam lithography, then we chose perfluoropolyether(PFPE) as a mold to replicate the periodic triangle structure on silicon master. A photoresist material of SU-8 used as an imprint material was coated on the ITO glass, and Poly(dimethylsiloxane) (PDMS) used as an vertical alignment layer by an external hydrophobic property. For the contrast, we also fabricated the periodic nano-rectangular groove with 1μm pitch to assemble VA LC cell by some processes. It demonstrated that the LC cell of periodic nano-wedges structure has better optical symmetry than the periodic nano-rectangular groove and prevent reverse-twist domains.