Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray

博士 === 國立成功大學 === 物理學系碩博士班 === 100 === Monochromatic soft x-ray-induced reactions of CF2Cl2 adsorbed on Si(111)-7×7 at 30 K near the Si(2p) and F(1s) edges were studied by using three new surface analytic techniques proposed by our research group: (1) Continuous-time photoelectron spectroscopy (PES)...

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Main Authors: Shing-KuenWang, 王興焜
Other Authors: Ching-Rong Wen
Format: Others
Language:en_US
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/61256594559440150671
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spelling ndltd-TW-100NCKU51980042015-10-13T21:33:11Z http://ndltd.ncl.edu.tw/handle/61256594559440150671 Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray 單色軟X光引發吸附在Si(111)-7x7矽單晶表面的分子之隨時間變化的光物理及光化學研究 Shing-KuenWang 王興焜 博士 國立成功大學 物理學系碩博士班 100 Monochromatic soft x-ray-induced reactions of CF2Cl2 adsorbed on Si(111)-7×7 at 30 K near the Si(2p) and F(1s) edges were studied by using three new surface analytic techniques proposed by our research group: (1) Continuous-time photoelectron spectroscopy (PES), (2) Photon-exposure-dependent photon-stimulated desorption (PSD), and (3) Continuous-time photon-stimulated desorption spectroscopy. During the continual irradiation of 98/120 eV photons, the continuous-time photoelectron spectra showed that the adsorbed molecules are dissociated. The photolysis cross sections were deduced from these spectra and found to be ~1.4×10−18 and ~8.0×10−18 cm2, respectively. The mechanisms responsible for the dissociation of CF2Cl2 molecules by the photons near the Si(2p) edge are dissociative electron attachment (DEA) and indirect dipolar dissociation (IDD). The fluorosilyl species produced on the surface during the photon irradiation is SiF. On the other hand, the continuous-time photon-stimulated desorption spectroscopy was employed to investigate the photoreactions of CF2Cl2 adsorbed on silicon surface near the F(1s) edge. The variation of spectral shapes in the sequential F+ PSD spectra shows the consumption of the CF2Cl2 molecules and the production of surface SiF species as a function of photon exposure. The F+ PSD spectrum and total electron yield (TEY) spectrum of solid CF2Cl2 were also measured in order to study the excitation mechanisms of F(1s) core level of the adsorbed CF2Cl2. The mechanisms responsible for the dissociations of the adsorbed molecules are DEA, IDD and direct excitation of F(1s) core level. The photolysis cross section of the CF2Cl2 molecules by photons with varying energy (681–704 eV) is deduced from the sequential F+ PSD spectra and found to be ~6.0×10−18 cm2. Ching-Rong Wen 溫清榕 2012 學位論文 ; thesis 65 en_US
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description 博士 === 國立成功大學 === 物理學系碩博士班 === 100 === Monochromatic soft x-ray-induced reactions of CF2Cl2 adsorbed on Si(111)-7×7 at 30 K near the Si(2p) and F(1s) edges were studied by using three new surface analytic techniques proposed by our research group: (1) Continuous-time photoelectron spectroscopy (PES), (2) Photon-exposure-dependent photon-stimulated desorption (PSD), and (3) Continuous-time photon-stimulated desorption spectroscopy. During the continual irradiation of 98/120 eV photons, the continuous-time photoelectron spectra showed that the adsorbed molecules are dissociated. The photolysis cross sections were deduced from these spectra and found to be ~1.4×10−18 and ~8.0×10−18 cm2, respectively. The mechanisms responsible for the dissociation of CF2Cl2 molecules by the photons near the Si(2p) edge are dissociative electron attachment (DEA) and indirect dipolar dissociation (IDD). The fluorosilyl species produced on the surface during the photon irradiation is SiF. On the other hand, the continuous-time photon-stimulated desorption spectroscopy was employed to investigate the photoreactions of CF2Cl2 adsorbed on silicon surface near the F(1s) edge. The variation of spectral shapes in the sequential F+ PSD spectra shows the consumption of the CF2Cl2 molecules and the production of surface SiF species as a function of photon exposure. The F+ PSD spectrum and total electron yield (TEY) spectrum of solid CF2Cl2 were also measured in order to study the excitation mechanisms of F(1s) core level of the adsorbed CF2Cl2. The mechanisms responsible for the dissociations of the adsorbed molecules are DEA, IDD and direct excitation of F(1s) core level. The photolysis cross section of the CF2Cl2 molecules by photons with varying energy (681–704 eV) is deduced from the sequential F+ PSD spectra and found to be ~6.0×10−18 cm2.
author2 Ching-Rong Wen
author_facet Ching-Rong Wen
Shing-KuenWang
王興焜
author Shing-KuenWang
王興焜
spellingShingle Shing-KuenWang
王興焜
Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray
author_sort Shing-KuenWang
title Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray
title_short Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray
title_full Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray
title_fullStr Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray
title_full_unstemmed Basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on Si(111)-7x7 by monochromatic soft X-ray
title_sort basic studies on time-dependent surface photophysics and photochemistry of molecules adsorbed on si(111)-7x7 by monochromatic soft x-ray
publishDate 2012
url http://ndltd.ncl.edu.tw/handle/61256594559440150671
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