| Summary: | 碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 100 === In recent years, materials with multiple surface properties in micro/nano scale are created by modern material engineering. Precisely controlling of localized physical and chemical properties in designed patterns thus becomes a significant issue. In this study, taking octadecanethiolate (ODT) self-assembled monolayers (SAMs) as an ultra-thin resist on Au (111) substrate, a dielectric barrier discharged (DBD)-based micro-plasma stamp operated at atmospheric pressure is performed to micro scale pattern transfer. In this method, the DBD-based micro-plasma stamp with designed pattern is pressed on the ODT/Au by the nature magnetic force from permanent magnet inner electrode and thereafter, plasma is ignited inside the designed pattern for various exposure times. The results demonstrated that the chemical-specific pattern has been transferred to the ODT SAMs with less than 1 % distortion of all exposure times without significant change. The exact interaction between plasma and SAMs is the partly desorption of alkyl backbone and oxidation of ODT matrix, which alter the resistance property for wet etching process. An absorbates layer forming during plasma treatment also plays an important role for pattern transferring, which can be demonstrated by the analysis after applying washing procedure to the patterned samples. The etching rate of washed sample increases 1.6 times to unwashed one. Consequently, patterns with ~3 % broadening can be successfully replicated into underlaying Au substrates. This study confirms the feasibility of utilizing DBD-based microplasma stamp to transfer patterns on SAMs surface, and the efficiency of SAMs as an ultra-thin resist.
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