Surface patterning by solvent-assisted imprint lithography
博士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 100 === The rapid and effective pattern transfer method would be empolyed by the solvent-assisted imprinting lithography. Polymethylmethacrylate (PMMA) and ethyl alcohol (EtOH) are chosen for demonstrating a solvent-assisted imprint process working at room tempera...
Main Authors: | Kuan-LiangLai, 賴冠良 |
---|---|
Other Authors: | Min-Hsiung Hon |
Format: | Others |
Language: | zh-TW |
Published: |
2012
|
Online Access: | http://ndltd.ncl.edu.tw/handle/45770076468727182630 |
Similar Items
-
Production of Austenite Alloy Powder by Gas Atomization for Additive Manufacturing
by: Kuan-LiangLai, et al.
Published: (2015) -
Imprint template advances and surface modification, and defect analysis for step and flash imprint lithography
by: Bailey, Todd Christopher
Published: (2008) -
Multilevel Nanoengineering for Imprint Lithography
by: Konijn, Mark
Published: (2008) -
Imprint Lithography Using Soft Stamps
by: Yung-Lung Yang, et al.
Published: (2006) -
Development of Nano Electroplate Imprint Lithography
by: Wu Chun Yi, et al.
Published: (2006)