Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering

碩士 === 國立中興大學 === 材料科學與工程學系所 === 100 === In this study, the multi-target and dual-power (DC & RF) magnetron sputtering system was adopted to deposit anti-reflective films (SiO2 and TiO2) and transparent conducting film (indium-tin oxide, ITO) on polycarbonate substrates for touch plane applicati...

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Main Authors: Shui-Wen Li, 李水文
Other Authors: 武東星
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/49333838303369269578
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spelling ndltd-TW-100NCHU51590102017-06-25T04:37:48Z http://ndltd.ncl.edu.tw/handle/49333838303369269578 Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering 以多靶磁控濺鍍法在聚碳酸酯基板上製備高穿透氧化銦錫導電膜之研究 Shui-Wen Li 李水文 碩士 國立中興大學 材料科學與工程學系所 100 In this study, the multi-target and dual-power (DC & RF) magnetron sputtering system was adopted to deposit anti-reflective films (SiO2 and TiO2) and transparent conducting film (indium-tin oxide, ITO) on polycarbonate substrates for touch plane applications. Before simulating the optical performance of this functional coating, the single-layer material such as SiO2, TiO2 and ITO was deposited on the Si substrates to acquire the corresponding reflectivity, absorptivity and refractive index data using an ellipseometer. The polycarbonate substrates were cleaned using O2 plasma before each coating process. The optical multilayer coatings were deposited with various process parameters such as sputtering power, substrate temperature and working pressure. The resistivity, transmittance, microstructure and mechanical characteristics of optical thin films were measured to evaluate the performance.In this work, the macromolecule polymer substrate (polycarbonate) with an endurance temperature of 100-130℃was used to replace the conventional glass substrate due to its lower cost. Since the ITO thin film has high transmittance (in the visible region) and low resistivity, the ITO thin film deposited on PC substrate can act as a potential structure for touch plane applications. Under optimum deposition conditions, where the working temperature, RF power, Ar and O2 flow rates were controlled on room temperature, 1.6 KW, 300 sccm and 2.2 sccm, respectively, the 20 nm ITO thin film with sheet resistivity of 300-600 Ω/□ and visible light transmittance of 88% was achieved. The successive ITO and anti-reflective coating process within the same multi-target and sputtering system, the transmittance of this functional coating can be improved to 91%. By integrating the cover glass, cover lens and adhesion glue, the developed functional multilayer (ITO with antireflection) shows high potential in touch panel applications. 武東星 2012 學位論文 ; thesis 62 zh-TW
collection NDLTD
language zh-TW
format Others
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description 碩士 === 國立中興大學 === 材料科學與工程學系所 === 100 === In this study, the multi-target and dual-power (DC & RF) magnetron sputtering system was adopted to deposit anti-reflective films (SiO2 and TiO2) and transparent conducting film (indium-tin oxide, ITO) on polycarbonate substrates for touch plane applications. Before simulating the optical performance of this functional coating, the single-layer material such as SiO2, TiO2 and ITO was deposited on the Si substrates to acquire the corresponding reflectivity, absorptivity and refractive index data using an ellipseometer. The polycarbonate substrates were cleaned using O2 plasma before each coating process. The optical multilayer coatings were deposited with various process parameters such as sputtering power, substrate temperature and working pressure. The resistivity, transmittance, microstructure and mechanical characteristics of optical thin films were measured to evaluate the performance.In this work, the macromolecule polymer substrate (polycarbonate) with an endurance temperature of 100-130℃was used to replace the conventional glass substrate due to its lower cost. Since the ITO thin film has high transmittance (in the visible region) and low resistivity, the ITO thin film deposited on PC substrate can act as a potential structure for touch plane applications. Under optimum deposition conditions, where the working temperature, RF power, Ar and O2 flow rates were controlled on room temperature, 1.6 KW, 300 sccm and 2.2 sccm, respectively, the 20 nm ITO thin film with sheet resistivity of 300-600 Ω/□ and visible light transmittance of 88% was achieved. The successive ITO and anti-reflective coating process within the same multi-target and sputtering system, the transmittance of this functional coating can be improved to 91%. By integrating the cover glass, cover lens and adhesion glue, the developed functional multilayer (ITO with antireflection) shows high potential in touch panel applications.
author2 武東星
author_facet 武東星
Shui-Wen Li
李水文
author Shui-Wen Li
李水文
spellingShingle Shui-Wen Li
李水文
Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering
author_sort Shui-Wen Li
title Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering
title_short Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering
title_full Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering
title_fullStr Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering
title_full_unstemmed Fabrication of high-transmittance ITO conducting films on PC substrates using multi-target sputtering
title_sort fabrication of high-transmittance ito conducting films on pc substrates using multi-target sputtering
publishDate 2012
url http://ndltd.ncl.edu.tw/handle/49333838303369269578
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