Studies on the preparation of nanostructure anti-reflection film by etching methods and application on solar cell

• Main Authors: Yung-Chih Lin, 林勇志
• Other Authors: 蕭明謙
• Format: Others
• Language: zh-TW
• Published: 2012
• Online Access: http://ndltd.ncl.edu.tw/handle/76641132673579993583

碩士 === 崑山科技大學 === 機械工程研究所 === 100 === The objective of this study is to enhance the cell efficiency of single crystal silicon solar cell by etching method. Solar cell design involves specifying the parameters of a solar cell structure in order to maximise efficiency, given a certain set of constraints. In this thesis, the feasibility study was done which included with the (1) methods of surface texturing silicon solar wafer (2) optical effects of silicon nitride (Si3N4) Anti- Reflective Coatings(ARC) (3) etching method of nanostructure anti-reflection film (4) the measurement of c-Si solar cell efficiency. By optimizing the method of the silicon surface texturing and the thickness of Si3N4 Anti-Reflective Coatings, we used the SF6 plasma to texture the Si3N4 ARC with 80nm. The etching results indicate that an average reflectance of less than 1% in the wavelength range from 250nm to 400nm. As a result, the cell efficiency with nanostructure anti-reflection film by etching methods is enhanced about 0.1%.