| Summary: | 碩士 === 義守大學 === 電子工程學系 === 100 === Now, the surface roughness manufacturing and antireflection coating on single-crystal silicon solar cells are mainly used to enhance conversion efficiency. In this study, the single crystal silicon is used as the absorption layer of solar cells. At first, the single crystal silicon was dry etched by yellow light radiation through the designed mask, and then put this sample into the potassium hydride (KOH) solution for wet etching, the irregular pyramid structures had been produced on the surface of quasi-mountain regular structure, which is defined as the double surface coarsening (DSC) structures. In order to absorb a wide range incident light, the surface of finished double coarsening structures was deposited the double antireflection layer as SiO2/TiO2 (DLAR). The results show after both the double layer anti-reflective film (20nm/20nm) to compare with pure single silicon, which increase 43% increasing in short-circuit current density (Jsc) effective, and the cell conversion efficiency increases over 48.8 %, compared with the sputtering method by the evaporation SiO2/TiO2 double layer anti-reflective film (thickness 40nm/20nm) short-circuit current density (Jsc) effective upgrade to 28.56mA/cm2, solar cell conversion efficiency to enhance the overall 10.9%.
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