Improvement of Film Thickness of the Hole Blocking Layer and Hole Injection Layer in OLED

碩士 === 建國科技大學 === 電子工程系暨研究所 === 100 === We improved the OLED structure of ITO/m-MTDATA/NPB/Alq3/BPhen/LiF/Al by using film thinkness adjustment. After multiple rounds of improvement, the best thicknesses for m-MTDATA and BPhen in this structure were established to be 20 nm and 60 nm, respectively. T...

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Bibliographic Details
Main Author: 周冠呈
Other Authors: 呂輝宗
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/44491649750025387687
Description
Summary:碩士 === 建國科技大學 === 電子工程系暨研究所 === 100 === We improved the OLED structure of ITO/m-MTDATA/NPB/Alq3/BPhen/LiF/Al by using film thinkness adjustment. After multiple rounds of improvement, the best thicknesses for m-MTDATA and BPhen in this structure were established to be 20 nm and 60 nm, respectively. The device drive voltage was 3.5 V, luminous efficiency reached 5.2 cd/A, and the maximum brightness was 13690 cd/m2. Compared to devices with a doped electron transport layer within the structure of ITO/m-MTDATA/NPB/Alq3/BPhen:Liq/LiF/Al, the device drive voltage was 4.6 V, luminous efficiency reached 4.9 cd/A, this improvement was able to reduce the producing cost.