The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers

碩士 === 國立中正大學 === 光機電整合工程研究所 === 100 === This paper prepared by solution with Yttrium doped indium oxide as the transparent conductive thin film. Change the various mole ratio of yttrium as the active layer of thin-film transistors. It used mainly by the electronegativity difference of Y and O is gr...

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Main Authors: Lin, Yan Feng, 林彥鋒
Other Authors: Ting, Chu Chi
Format: Others
Language:zh-TW
Published: 2012
Online Access:http://ndltd.ncl.edu.tw/handle/86348794058301798370
id ndltd-TW-100CCU00651007
record_format oai_dc
spelling ndltd-TW-100CCU006510072015-10-13T21:06:54Z http://ndltd.ncl.edu.tw/handle/86348794058301798370 The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers 釔摻雜氧化銦透明薄膜電晶體之光電特性與介電層材料研究探討 Lin, Yan Feng 林彥鋒 碩士 國立中正大學 光機電整合工程研究所 100 This paper prepared by solution with Yttrium doped indium oxide as the transparent conductive thin film. Change the various mole ratio of yttrium as the active layer of thin-film transistors. It used mainly by the electronegativity difference of Y and O is greater than In and O, to reduce the oxygen vacancy generation and concentration, suitable for thin film transistor. GIXRD observation crystal of YIO thin films, and can calculate the grain size about 10nm size. To use SEM, AFM observations of its surface morphology. To use hall measurement to measure YIO hall mobility, resistivity and carrier concentration. XPS verified that the vacancy related oxygen decreased with increasing of Y concentration. It can confirm that YIO transparent thin films can be made into a good transistor active layer. In addition, dielectric layers is also the part for research. The optimum YIO TFT occurred at a YIO mole ratio of 0.12:1 and its channel mobility, threshold voltage, subthreshold swing voltage, and on/off ratio were 3.80 cm2/Vs, 18.00 V, 2.15 V/decade, and ~105, respectively. Ting, Chu Chi 丁初稷 2012 學位論文 ; thesis 106 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立中正大學 === 光機電整合工程研究所 === 100 === This paper prepared by solution with Yttrium doped indium oxide as the transparent conductive thin film. Change the various mole ratio of yttrium as the active layer of thin-film transistors. It used mainly by the electronegativity difference of Y and O is greater than In and O, to reduce the oxygen vacancy generation and concentration, suitable for thin film transistor. GIXRD observation crystal of YIO thin films, and can calculate the grain size about 10nm size. To use SEM, AFM observations of its surface morphology. To use hall measurement to measure YIO hall mobility, resistivity and carrier concentration. XPS verified that the vacancy related oxygen decreased with increasing of Y concentration. It can confirm that YIO transparent thin films can be made into a good transistor active layer. In addition, dielectric layers is also the part for research. The optimum YIO TFT occurred at a YIO mole ratio of 0.12:1 and its channel mobility, threshold voltage, subthreshold swing voltage, and on/off ratio were 3.80 cm2/Vs, 18.00 V, 2.15 V/decade, and ~105, respectively.
author2 Ting, Chu Chi
author_facet Ting, Chu Chi
Lin, Yan Feng
林彥鋒
author Lin, Yan Feng
林彥鋒
spellingShingle Lin, Yan Feng
林彥鋒
The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers
author_sort Lin, Yan Feng
title The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers
title_short The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers
title_full The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers
title_fullStr The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers
title_full_unstemmed The Photoelectric Characteristics Research Of Yttrium-doped Indium Oxide Thin-Film Transistors And Dielectric Layers
title_sort photoelectric characteristics research of yttrium-doped indium oxide thin-film transistors and dielectric layers
publishDate 2012
url http://ndltd.ncl.edu.tw/handle/86348794058301798370
work_keys_str_mv AT linyanfeng thephotoelectriccharacteristicsresearchofyttriumdopedindiumoxidethinfilmtransistorsanddielectriclayers
AT línyànfēng thephotoelectriccharacteristicsresearchofyttriumdopedindiumoxidethinfilmtransistorsanddielectriclayers
AT linyanfeng yǐcànzáyǎnghuàyīntòumíngbáomódiànjīngtǐzhīguāngdiàntèxìngyǔjièdiàncéngcáiliàoyánjiūtàntǎo
AT línyànfēng yǐcànzáyǎnghuàyīntòumíngbáomódiànjīngtǐzhīguāngdiàntèxìngyǔjièdiàncéngcáiliàoyánjiūtàntǎo
AT linyanfeng photoelectriccharacteristicsresearchofyttriumdopedindiumoxidethinfilmtransistorsanddielectriclayers
AT línyànfēng photoelectriccharacteristicsresearchofyttriumdopedindiumoxidethinfilmtransistorsanddielectriclayers
_version_ 1718055165458644992