Deposition of Hydrophobic Film with 1,1,1,2-tetrafluoroethane Plasma Based on RF-Capacitively Couple Mode Discharge
碩士 === 元智大學 === 化學工程與材料科學學系 === 99 === This paper uses low pressure plasma polymerization technique to deposit fluorocarbon thin film on three substrates including in silicon wafer, polyethylene terephthalate (PET) and carbon paper. The low-pressure plasma was generated with radio frequency power at...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/57801278816790478386 |