Finite Element Analysis for Residual Stress of Oxide Thin Film on Flexible Substrate
碩士 === 國立雲林科技大學 === 光學電子工程研究所 === 99 === The goal of this study was to develop a method depends on Finite Element (FE) for analyzing residual stress of oxide thin film (SiO2 and Nb2O5) deposited on glass (BK7) or flexible substrate (PET and PC) by DC magnetron sputtering deposition. The thermal or i...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/89420769366069968771 |