An Investigation of ZnO (002) Thin Films Implanted by 40 keV Boron Ions
碩士 === 國立臺北科技大學 === 機電整合研究所 === 99 === In this study, the characteristics of ZnO films were investigated after the film was implanted with boron ions by using a 3MV Tandem Accelerator. The ZnO films were first deposited on the silicon and glass substrates. All specimens were then implanted the 40 ke...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/xa6jmw |