Multi-objective Optimization of Laser Scribing for Metal Thin Film on TFT-LCDs Using Grey Relation Analysis
碩士 === 國立臺北科技大學 === 機電整合研究所 === 99 === Traditional manufacturing of the thin film transistor liquid crystal display (TFT-LCD) uses wet process equipments, hence producing large amounts of toxic liquid waste. This study presents a method of using dry equipment with high-precision laser isolation...
Main Authors: | Hung-Ching Tsai, 蔡泓璟 |
---|---|
Other Authors: | 蕭俊祥 |
Format: | Others |
Language: | zh-TW |
Published: |
2011
|
Online Access: | http://ndltd.ncl.edu.tw/handle/rr77g2 |
Similar Items
-
The electric properties of TFT film device on LCOS-LCDs
by: SUN, Pei-Feng, et al.
Published: (2002) -
Laser scribing of thin-film solar cell module
by: Po-Ching Huang, et al.
Published: (2011) -
Study On Thin TFT-LCD Substrate Scribing Process.
by: Jia-Hsin Liu, et al.
Published: (2012) -
Design of Driving Circuits for TFT-LCDs
by: Yen-Ting Chen, et al.
Published: (2007) -
The design and synthesis of nematic liquid crystals for the use in STN-LCDs and AM-TFT-LCDs
by: Campbell, Neil Lester
Published: (2003)