| Summary: | 碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 99 === In this study, we have grown Nb-doped anatase TiO2 ( x= 0, 0.05, 0.1, 0.15, 0.2 Ti1-xNbxO2 ) transparent conducting films on eagle 2000 glass using chemical solution deposition and subsequent annealing in 10% H2+90% N2 atmosphere. The films annealed 400°C, 500°C, 600°C for 1hr. XRD measurment showed that all the Nb-doped TiO2 films fromed polycrystalline anatase structure after post-annealing. UV-Visible measurement showed the transmittance of films. All the films exhibt 70-80% transmittance in the visible region. Four point probe measurement the films annealed 600°C for 1hr, as Nb concentration increase from x= 0 to x= 0.2 the resistivity from 22.46 Ω-cm to 0.45 Ω-cm. The hall effect measurment showed carrier density at x= 0.2 have maxine value 1.83×1021 cm-3 n-type transmittance conductive thin films,the hall mobility 5-10 cm2V-1s-1 , FE-SEM showed the films cross section, the films thickness are 400 nm average.
After we have grown Nb-doped anatase TiO2 Ti0.7Nb0.3O2, the film on eagle 2000 glass using chemical solution deposition. The film annealed in 10% H2+90% N2 atmosphere 600°C for different annealed hours (1hr, 3hr, 6hr). Used four point probe measurment the film annealed 6hr have the lower resistivity 5×10-2 Ω-cm.
On DC magnetron sputtering we used Ti target to from TiO2 films were deposited on eagle 2000 glass. The films after post-annealing in 10% H2+90% N2 atmosphere at 600°C for different annealed hours (1hr, 6hr). XRD measurment showed oxygen mass flow 2 sccm annealed 1hr and 6hr is anatase TiO2 structure. The lower resistivity at oxygen mass flow 2 sccm annealed 1hr is 9×10-3 Ω-cm. UV-Visible showed oxygen mass flow 2 sccm annealed 1hr and 6hr, the transmittance is 45% and 25% in the visible region.
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