Imaging Ellipsometry For The Thin Film Stress Measurement
碩士 === 國立聯合大學 === 光電工程學系碩士班 === 99 === This paper is to study the films under stress, using of imaging ellipsometry to measure the size of stress, changes in optical constants and film thickness change. We use SiO2/Si as sample, this study shows that the sample under stress before and after, sample’...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2010
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| Online Access: | http://ndltd.ncl.edu.tw/handle/16717635113381018446 |