(1) Qualitative and quantitative study on outgassing from thin-film materials upon irradiation at 13.5 nm(2) Absolute photoionization of organic solvents in the 70-150 eV range
碩士 === 國立高雄大學 === 應用化學系碩士班 === 99 === (1) Extreme ultraviolet (EUV) light at 13.5 nm is regarded as the most likely excitation source for microlithography processing beyond the 16 nm technology node of IC manufacturing. Outgassing from photoresists or underlayer materials upon the EUV exposure...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/66690419178283138169 |