Analysis on Pad Performances and Planarization Effects for CMP

碩士 === 國立臺灣科技大學 === 機械工程系 === 99 === The properties and surface textures of the pads would strongly affect the CMP efficiency. Moreover, the grooving design on the pad is an important consideration in pad design. The good grooving design would have several advantages to the CMP process, such as enha...

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Bibliographic Details
Main Authors: Ching-Tang Hsueh, 薛慶堂
Other Authors: Chao-Chang Chen
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/98246r