| Summary: | 碩士 === 國立臺南大學 === 材料科學系碩士班 === 99 === For utilizing zinc oxide (ZnO) nanorods in nanodevice fabrication, it is crucial to control the ZnO nanorods orderly grown on a nonspecific substrate and at a desired location. In this study, two major steps are presented. First, a good control to grow ZnO nanorods with chemical bath deposition method is performed. Second, ZnO nanorods are grown with a pre-defined nano-pattern generated by electron beam lithography.
The ZnO seeds, as an important role for ZnO nanorods growing, are prepared and characterized by SEM, AFM, and XRD. The mixture solution of zinc acetate and HMTA (1:1) is prepared for ZnO nanorods deposition. It is found that 0.01 M zinc acetate at 90 ℃gives the best results for growing nanorods. The fabricated nanorod has diameter ranging between 100 nm and 300 nm with the rod length near a micron. Using a combination of the rod growing method and the electron beam lithography, nanorod arrays as well as other orderly single-rod patterns are obtained. The size of the rod can be controlled by the concentration of chemical bath, temperature, and photoresist pattern. The study may provide a new route for the ZnO nanorod application in nanodevice fabrication.
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