Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System

Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System

碩士 === 國立清華大學 === 工程與系統科學系 === 99

Bibliographic Details
Main Authors:	Lin, Ching-Po, 林敬博
Other Authors:	Leou, Keh-Chyang
Format:	Others
Language:	zh-TW
Published:	2011
Online Access:	http://ndltd.ncl.edu.tw/handle/86271468842952277528

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