Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System

Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System

碩士 === 國立清華大學 === 工程與系統科學系 === 99

Bibliographic Details
Main Authors: Lin, Ching-Po, 林敬博
Other Authors: Leou, Keh-Chyang
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/86271468842952277528
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spelling ndltd-TW-099NTHU55930512015-10-13T20:23:00Z http://ndltd.ncl.edu.tw/handle/86271468842952277528 Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System 電漿輔助化學氣相沉積製程研究非晶矽碳化物薄膜之放射光譜量測分析與薄膜特性之關聯性 Lin, Ching-Po 林敬博 碩士 國立清華大學 工程與系統科學系 99 Leou, Keh-Chyang 柳克強 2011 學位論文 ; thesis 93 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 工程與系統科學系 === 99
author2 Leou, Keh-Chyang
author_facet Leou, Keh-Chyang
Lin, Ching-Po
林敬博
author Lin, Ching-Po
林敬博
spellingShingle Lin, Ching-Po
林敬博
Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System
author_sort Lin, Ching-Po
title Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System
title_short Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System
title_full Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System
title_fullStr Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System
title_full_unstemmed Correlation between Analysis of Optical Emission Spectrum and Properties of a-Si1-xCx:H Thin Film Deposited by Plasma Enhanced Chemical Vapor Deposition System
title_sort correlation between analysis of optical emission spectrum and properties of a-si1-xcx:h thin film deposited by plasma enhanced chemical vapor deposition system
publishDate 2011
url http://ndltd.ncl.edu.tw/handle/86271468842952277528
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