Thin Film Residual Stress Assessment of Capacitive MEMS Microphones Using Process Modeling Technology

Thin Film Residual Stress Assessment of Capacitive MEMS Microphones Using Process Modeling Technology

碩士 === 國立清華大學 === 動力機械工程學系 === 99

Bibliographic Details
Main Authors:	Wang, Han-Jung, 王涵融
Other Authors:	Chiang, Kuo-Ning
Format:	Others
Language:	zh-TW
Published:	2011
Online Access:	http://ndltd.ncl.edu.tw/handle/81174493576901612882

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