Study on the electrodeposition parameters of the growth DLC thin film

• Main Authors: Yu-Ren Chiou, 邱郁壬
• Other Authors: Herng-Yih Ueng
• Format: Others
• Language: zh-TW
• Published: 2011
• Online Access: http://ndltd.ncl.edu.tw/handle/57602660073844913651

碩士 === 國立中山大學 === 電機工程學系研究所 === 99 === In this study, DLC thin films were electrodeposited at low DC potential using a mixture of acetic acid and DI water with different ratio. The parameters of DLC thin film deposition include the DC potential, deposition temperature, concentration of electrolyte solution, were correlated to the growth mechanism. The amount of nitrogen incorporated into DLC thin films were varied with the deposited temperature. The characteristics of DLC films by various measurements such as : the I-t curves of DLC film growth, SEM, AFM, FTIR, XPS, Raman and N&K spectroscopy, were investigated in detail. Experimental results showed that the surface roughness decreased, and sp3/sp2+sp3 value of DLC increased with the deposition temperature and deposition time. Optical properties showed that the refractive index, optical energy gap increased with the deposition temperature. For SEM cross-section measurement, it showed that the thickness of DLC films decreased due to the erosion process. However, the N-DLC films become graphitization. According to our study, we find that the surface morphology of the N-DLC films are homogeneous and compact. However, with the increase of the deposition temperature, the ratio of sp3-C-N bonds increase and the ratio of sp2-C-C bonds decrease, and these lead to the increase of refractive index and optical energy gap.