Effect of anneal temperature and plasma treatment on the performance of IGZO
碩士 === 國立交通大學 === 工學院半導體材料與製程設備學程 === 99 === In recent years, as far as the specifications of the flat panel displays are concerned, with the need to scale up the panel size and increase the resolution, the requirements of the array process are becoming more demanding. Take the requirement of th...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/15871600314413417795 |