Study of post-annealing process on fluorine-doped tin oxide films by UV laser

• Main Authors: Tseng, Yen-Pin, 曾彥彬
• Other Authors: Chou, Chang-Ping
• Format: Others
• Language: zh-TW
• Published: 2011
• Online Access: http://ndltd.ncl.edu.tw/handle/77369447503661440411

碩士 === 國立交通大學 === 機械工程學系 === 99 === The effects of post-annealing on structural, electrical, mechanical, and optical properties of the fluorine-doped tin oxide (FTO) thin films by ultraviolet (UV) laser irradiations were investigated in this study. The annealing process parameters such as laser energies, scan speeds of scanning galvanometer, and spot sizes of defocus laser fabricated at an ambient temperature were adjusted. The surface morphology and roughness of annealed films were observed by a scanning electron microscope (SEM) and an atomic force microscope (AFM), respectively. Moreover, the electrical and mechanical properties were measured by a hall instrument and a nanoindentation, respectively. The optical properties of transmittance were measured by an UV-VIS spectrophotometer. Under optimized laser annealed conditions including 1 mm of spot size, 164 µJ of laser energy, and 800 mm/s of scan speed, the resistivity of the annealed film was reduced from 1.26x10-2 Ω-cm to 6.17x10-3 Ω-cm, and the average optical transmittance of the annealed FTO/glass substrate was enhanced from 81.2% to 86.4% in the visible range. In addition, the microhardness and reduced modulus of these annealed FTO films slightly increased and decreased with increasing the laser energy measured by the nanoindentation. The SEM observed images showed that the grain sizes of annealed FTO films increased with increasing the laser energy. Furthermore, the AFM measured results showed that the surface roughness of annealed FTO films slightly increased with increasing the laser energy.