Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns

碩士 === 國立交通大學 === 材料科學與工程學系 === 99 === As generally recognized, built-in electric field will emerge along the polar c-axis of GaN epitaxial layers when growing the GaN base LEDs on a-、c-plane sapphire substrates. This may cause distortions of energy band gap, thereby decreases the recombination...

Full description

Bibliographic Details
Main Authors: Cheng, Wen-Hao, 鄭文豪
Other Authors: Wu, Yew-Chung
Format: Others
Language:zh-TW
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/81317639689335708861
id ndltd-TW-099NCTU5159058
record_format oai_dc
spelling ndltd-TW-099NCTU51590582015-10-13T20:37:10Z http://ndltd.ncl.edu.tw/handle/81317639689335708861 Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns 週期性線狀圖案a-plane藍寶石基板成長半極性氮化鎵薄膜之研究 Cheng, Wen-Hao 鄭文豪 碩士 國立交通大學 材料科學與工程學系 99 As generally recognized, built-in electric field will emerge along the polar c-axis of GaN epitaxial layers when growing the GaN base LEDs on a-、c-plane sapphire substrates. This may cause distortions of energy band gap, thereby decreases the recombination probability of electron-hole pairs and affects the internal quantum efficiency of such a structure. Moreover, energy band gap distortions will also produce red-blue shift in the emission wavelength. In order to alleviate this built-in electric field, non-polar or semi-polar GaN should be grown on sapphire instead. In this thesis, a-plane line patterned sapphire substrates followed by growth of LED structure are fabricated and non-polar or semi-polar GaN is expected to grow on sapphire substrates. In the first experiment, the dry etching method is employed to produce both Pyramid-DPSS and Flat-DPSS with line patterns parallel to the flat of sapphire substrates. And the Flat-DPSS is observed to possess better properties in SEM surface morphology、FWHM of XRC and PL intensity…etc. However, it is examined to still be polar c-plane GaN under XRD θ-2θ scan. On the other hand, the semi-polar (10-11)GaN successfully grows on Pyramid-DPSS by its side walls.   In the second experiment, the a-plane line patterned sapphire substrates with 30° miscut to sapphire flat is fabricated. The semi-polar (10-11)GaN is successfully grown on specific (13-46)sapphire plane exposed by hybrid dry plus wet etching. And the wet etching method can repair the damaged surface caused by dry etching. Nevertheless, problems of growth rate and surface morphology still exist. The red-blue shift issues exist in LED devices manufacture may be resolved if these problems are overcome in the future research. Wu, Yew-Chung 吳耀銓 2011 學位論文 ; thesis 72 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 材料科學與工程學系 === 99 === As generally recognized, built-in electric field will emerge along the polar c-axis of GaN epitaxial layers when growing the GaN base LEDs on a-、c-plane sapphire substrates. This may cause distortions of energy band gap, thereby decreases the recombination probability of electron-hole pairs and affects the internal quantum efficiency of such a structure. Moreover, energy band gap distortions will also produce red-blue shift in the emission wavelength. In order to alleviate this built-in electric field, non-polar or semi-polar GaN should be grown on sapphire instead. In this thesis, a-plane line patterned sapphire substrates followed by growth of LED structure are fabricated and non-polar or semi-polar GaN is expected to grow on sapphire substrates. In the first experiment, the dry etching method is employed to produce both Pyramid-DPSS and Flat-DPSS with line patterns parallel to the flat of sapphire substrates. And the Flat-DPSS is observed to possess better properties in SEM surface morphology、FWHM of XRC and PL intensity…etc. However, it is examined to still be polar c-plane GaN under XRD θ-2θ scan. On the other hand, the semi-polar (10-11)GaN successfully grows on Pyramid-DPSS by its side walls.   In the second experiment, the a-plane line patterned sapphire substrates with 30° miscut to sapphire flat is fabricated. The semi-polar (10-11)GaN is successfully grown on specific (13-46)sapphire plane exposed by hybrid dry plus wet etching. And the wet etching method can repair the damaged surface caused by dry etching. Nevertheless, problems of growth rate and surface morphology still exist. The red-blue shift issues exist in LED devices manufacture may be resolved if these problems are overcome in the future research.
author2 Wu, Yew-Chung
author_facet Wu, Yew-Chung
Cheng, Wen-Hao
鄭文豪
author Cheng, Wen-Hao
鄭文豪
spellingShingle Cheng, Wen-Hao
鄭文豪
Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns
author_sort Cheng, Wen-Hao
title Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns
title_short Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns
title_full Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns
title_fullStr Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns
title_full_unstemmed Growth of semipolar GaN films on a-plane sapphire substrates with periodic line patterns
title_sort growth of semipolar gan films on a-plane sapphire substrates with periodic line patterns
publishDate 2011
url http://ndltd.ncl.edu.tw/handle/81317639689335708861
work_keys_str_mv AT chengwenhao growthofsemipolarganfilmsonaplanesapphiresubstrateswithperiodiclinepatterns
AT zhèngwénháo growthofsemipolarganfilmsonaplanesapphiresubstrateswithperiodiclinepatterns
AT chengwenhao zhōuqīxìngxiànzhuàngtúànaplanelánbǎoshíjībǎnchéngzhǎngbànjíxìngdànhuàjiābáomózhīyánjiū
AT zhèngwénháo zhōuqīxìngxiànzhuàngtúànaplanelánbǎoshíjībǎnchéngzhǎngbànjíxìngdànhuàjiābáomózhīyánjiū
_version_ 1718049393866702848