Characteristics and processing windows of Cr-N-O thin films prepared by DC magnetron sputtering using air as a reactive gas
碩士 === 國立中興大學 === 材料科學與工程學系所 === 99 === The objective of this study is to prepare different Cr-N-O thin films by using air as a reactive gas instead of conventional used nitrogen and oxygen gas. The process was conducted at high base pressures (low vacuum), which could substantially reduce the pumpi...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/05058347703963124082 |