Development of low-cost antireflection coating processing technology and for solar cell application

• Main Authors: Chia Ho Chu, 朱家和
• Other Authors: Shui-Yang Lien
• Format: Others
• Language: zh-TW
• Published: 2011
• Online Access: http://ndltd.ncl.edu.tw/handle/41579932519560570269

碩士 === 明道大學 === 材料科學與工程學系碩士班 === 99 === Solar cell is one of renewable energy that is expected to alternate a part of conventional fossil energy. Therefore, cheaper routes for producing solar grade silicon are being developed in the PV industries, but the progress is slow. Consequently, seeking a feasible and low-cost route for producing silicon solar cell with high energy transfer efficiency is important for the PV industry. TiO2 and SiO2/TiO2 are developed for the antireflective coating by using SOG (spin on glass) process. The Si wafer coating with TiO2 film showed a low reflectivity of as low as 10.9 %. The results show that the open circuit voltage, Voc, is 0.60V, short-circuit current, Isc, is 7.18, fill factor, FF, is 0.76, and efficiency 13.51%. The Si wafer coating with Sio2/TiO2 film showed a low reflectivity of as low as 7.31 %, and the results obtained by Voc is 0.61V, Isc is 7.89, FF is 0.76, efficiency is 15.09 %. These results showed the feasibility of the proposed method. This study provided a possibility to realize a new fabrication process for achieving low cost solar cells.