Optimization of amorphous silicon thin film solar cell processes by using optical emission spectroscopy
碩士 === 明道大學 === 材料科學與工程學系碩士班 === 99 === Radio-frequency (RF) Parallel plate reactors are commonly used for plasma-enhanced chemical vapor deposition (PECVD) of hydrogenated amorphous silicon (a-Si:H) thin films. Non-intrusive plasma diagnostics for industrial RF parallel-plate reactors can be useful...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/70094192830067080359 |