| Summary: | 碩士 === 義守大學 === 電子工程學系碩士班 === 99 === The major research in this thesis is the silicon as the substrate of solar cell in order， to enhance the conversion efficiency the surface manufacturing technology was done. By roughing surface structure in the silicon and sputtering anti-reflective film to enhance the absorption of the anti-reflective layer，which will increase the photoelectric conversion efficiency. In this study, the photolithography process had bean done first and then using anisotropic wet etching to form a double surface coarsening structure, the radio frequency magnetron sputtering deposited SiO2/TiO2 thin film to form double anti-reflective layer in the surface of silicon base solar cell. The results shown that such a structure by double surface coarsening and double layer anti-reflective film in the surface, the average reflectivity is 9.94%. The scanning electron microscopy shown the order arrangement pyramids，and also overlap small irregular pyramid structure on the surface. This surface structure can increase the absorption by the second refraction, and thus enhance the absorption of solar energy. Sputtering double anti-reflective film provides a low distribution of reflectivity over a wide wavelength range, this range includes higher power of the solar spectrum, and significantly reduce the surface reflection of incident light, which enhance the conversion efficiency of solar cells.
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