The Comparison of Monitoring Critical Dimension in A Photolithography Process Using Hotelling T2 and Shewhart Control Charts
碩士 === 輔仁大學 === 應用統計學研究所 === 99 === Technology is growing dramatically. The latest technology has been applied on electric products extensively. It also leads the rapid development of semi-conductor industry. Therefore, quality and technology are getting important. However, single-variable control...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2011
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| Online Access: | http://ndltd.ncl.edu.tw/handle/69295016607706316896 |