The Comparison of Monitoring Critical Dimension in A Photolithography Process Using Hotelling T2 and Shewhart Control Charts

• Main Authors: Wen-Ta Lin, 林文達
• Other Authors: Yuehjen E. Shao
• Format: Others
• Language: zh-TW
• Published: 2011
• Online Access: http://ndltd.ncl.edu.tw/handle/69295016607706316896

碩士 === 輔仁大學 === 應用統計學研究所 === 99 === Technology is growing dramatically. The latest technology has been applied on electric products extensively. It also leads the rapid development of semi-conductor industry. Therefore, quality and technology are getting important. However, single-variable control chart has not been able to met the need for process monitor. Hence, process monitor with multi-variable method is getting popular and significant. How to implement it effectively has consequently become an important issue. Photolithography is one of critical processes in DRAM industry and critical dimension at lithography is a considerable control item. Therefore, the study is going to compare single-variable control chart and Hotelling control chart with the case of three variables which are related to critical dimension. The result of analysis shows Hotelling control chart provides a great help to process engineers to discover problems before the process gets out of control.