Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films

碩士 === 長庚大學 === 化工與材料工程學系 === 99 === In this thesis research, zirconium oxide (ZrO2) thin films were prepared by sol-gel method and the effects of the type of annealing heat treatment (conventional furnace annealing (CFA) and rapid thermal annealing (RTA)) employed and the post-annealing atmosphe...

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Main Authors: Wen Yu Weng, 翁玟玉
Other Authors: H.C. Lu
Format: Others
Published: 2011
Online Access:http://ndltd.ncl.edu.tw/handle/75581250790913409073
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spelling ndltd-TW-099CGU050630012015-10-19T04:03:41Z http://ndltd.ncl.edu.tw/handle/75581250790913409073 Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films 溶膠-凝膠法製備二氧化鋯薄膜之物性和電性研究 Wen Yu Weng 翁玟玉 碩士 長庚大學 化工與材料工程學系 99 In this thesis research, zirconium oxide (ZrO2) thin films were prepared by sol-gel method and the effects of the type of annealing heat treatment (conventional furnace annealing (CFA) and rapid thermal annealing (RTA)) employed and the post-annealing atmosphere (N2, O2 or N2O) on the electrical and physical properties of the sol-gel derived ZrO2 thin films were investigated. In addition, the effect of crystal structure on the leakage current and the capacitance of the capacitors with sol-gel derived ZrO2 thin film dielectric layers was also investigated. From the experimental results, the sol-gel derived ZrO2 thin films annealed at 800℃ for 2 hour possessed the best electrical characteristics of a minimum leakage current of 9.74 x 10-9 amp and a dielectric constant of 10 when CFA process was employed. Employing RTA process, the sol-gel derived ZrO2 thin films annealed at 800℃ for 60 seconds under N2 atmosphere possessed the highest dielectric constant of 21 but also a high leakage current of 5.56 x 10-6 amp. H.C. Lu 盧信冲 2011 學位論文 ; thesis 90
collection NDLTD
format Others
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description 碩士 === 長庚大學 === 化工與材料工程學系 === 99 === In this thesis research, zirconium oxide (ZrO2) thin films were prepared by sol-gel method and the effects of the type of annealing heat treatment (conventional furnace annealing (CFA) and rapid thermal annealing (RTA)) employed and the post-annealing atmosphere (N2, O2 or N2O) on the electrical and physical properties of the sol-gel derived ZrO2 thin films were investigated. In addition, the effect of crystal structure on the leakage current and the capacitance of the capacitors with sol-gel derived ZrO2 thin film dielectric layers was also investigated. From the experimental results, the sol-gel derived ZrO2 thin films annealed at 800℃ for 2 hour possessed the best electrical characteristics of a minimum leakage current of 9.74 x 10-9 amp and a dielectric constant of 10 when CFA process was employed. Employing RTA process, the sol-gel derived ZrO2 thin films annealed at 800℃ for 60 seconds under N2 atmosphere possessed the highest dielectric constant of 21 but also a high leakage current of 5.56 x 10-6 amp.
author2 H.C. Lu
author_facet H.C. Lu
Wen Yu Weng
翁玟玉
author Wen Yu Weng
翁玟玉
spellingShingle Wen Yu Weng
翁玟玉
Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films
author_sort Wen Yu Weng
title Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films
title_short Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films
title_full Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films
title_fullStr Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films
title_full_unstemmed Physical Characterization and Electrical Properties of Sol-gel-derived Zirconium Dioxide Films
title_sort physical characterization and electrical properties of sol-gel-derived zirconium dioxide films
publishDate 2011
url http://ndltd.ncl.edu.tw/handle/75581250790913409073
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