The Characterization and Performance of Nanostructure WO3 prepared by electrodeposition

• Main Authors: Yung-Hsin Chen, 陳永昕
• Other Authors: I-Ming Hung
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/01372923005455602807

碩士 === 元智大學 === 化學工程與材料科學學系 === 98 === In this papper , the WO3 thin film were prepared onto ITO glass substrate by electrodeposition method in an aqueous solution , in which the ITO glass was used as the working electrode and the electrolyte contained W powder (Tungsten) and H2O2(hydrogen peroxide) aqueous solution. The effects of electrodeposition conditions of WO3 , such as temperature, concentration of surfactant and potential , on morphology and properties of WO3 films were discussed. When the surfactant concentration increased from 0 M to 0.060 M , the Rmax and rms were respectively decreased from 146.6 nm to 338.6 nm and 9.2 nm to 47.7 nm . The morphology of WO3 films electrodeposited at 0.039 M concentraction is dense, however , the thickness of thin film was increased, and the transmittance is low. The surface altitude difference (Rmax) and roughness of WO3 thin film were increased as the temperature of electrodeposition solution increased. The Rmax and rms of WO3 thin film as electrodeposited at -0.45V were 94.6nm and 9.4nm，respectively.