| Summary: | 碩士 === 大同大學 === 化學工程學系(所) === 98 === Acetone, a commonly used solvent in TFT-LCD and semiconductor industries, is one of the major pollutants in the industrial wastewaters. Advanced oxidation processes (AOPs), such as O3 and O3/UV are widely used to decompose organic products in industrial wastewater. In AOP systems, the free radicals (OH‧) are the dominant species contributing to the degradation of organics in wastewater.
The study aims at investigating the decomposition efficiencies of acetone by O3 and O3/UV processes under varying experimental conditions such as initial pH, ozone feed flow rate, initial acetone concentration, reaction temperature, and UV light intensity. The experimental results show that the acetone removal efficiencies achieve highest in 120 min reaction time at pH 11 by the O3 and O3/UV processes, respectively. The acetone removal efficiency increases with decreasing initial acetone concentration, increasing ozone feed flow rate, or increasing UV light intensity. For the O3/UV process, the acetone removal efficiency decreases with increasing reaction temperature due to lower ozone solubility. For the O3 process, the effect of reaction temperature on the acetone removal efficiency is also influenced by the initial acetone concentration. Two kinetic models have been developed to correlate the experimental data of the O3 and O3/UV processes. The experimental and the predicted results under different experimental conditions are in fair agreement.
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