| Summary: | 碩士 === 國立臺北科技大學 === 機電整合研究所 === 98 === CMOS-MEMS process is directly from the general IC manufacturing in the CMOS process with micro-processing technology, it has the mechanical properties, thus using CMOS-MEMS process to fabricate MEMS components, not only has a general MEMS processing technology advantages, while because with normal IC fabrication compatible, easy integration with IC circuitry to form micro-electromechanical systems
The study is the use of standard CMOS processes and MEMS capacitor fabricated after the point of micro-microphone array. Besides, propose a fabrication method of directional microphone array can be produced, and with CMOS processes and circuits integrated into the chip. At the same time by computer simulation analysis software to do for the improvement of structural design of micro microphone; Finally, RLS provided by CIC after the process and the dry and wet etching steps to the microphone array structure of the establishment.
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