| Summary: | 碩士 === 南台科技大學 === 光電工程系 === 98 === In this study, titanium dioxide (TiO2) films were deposited on AAO templates by atomic layer deposition (ALD) at 300 °C with TiCl4 and H2O reactants. Ni nanocolumns were grown within the pores of those TiO2 coated AAO templates by electroplating, and then the AAO templates were dissolved in a 5 wt % H3PO4 solution to form TiO2/Ni nanocolumn arrays. The morphology, film structure, and photocatalytic properties of TiO2/Ni nanocolumn arrays were characterized by using SEM, XRD, and UV-Visible spectrometer , respectively.
The results show that the TiO2/Ni nanocolumn arrays were well prepared by ALD and electroplating via template approach. According to the morphologies of Ni nanocolumns, the diameter was in the range of 250~300 nm, and the length was between 6 to 40 μm, depending on the time of electroplating. The XRD patterns indicated that the deposited TiO2 films were all anatase. Photocatalytic efficiency
increased with the increase of TiO2 film thickness and the increase of Ni column length. The photocatalytic efficiency was further improved by the post ALD TiO2 on the prepared TiO2/Ni nanocolumns.
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