The thin film characteristics of aluminum oxide passivation by laser beam interferometry

• Main Authors: Tsai-Rung Shiu, 許財榮
• Other Authors: Jing-Dae Huang
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/fuuzm9

碩士 === 國立虎尾科技大學 === 機械與機電工程研究所 === 98 === This thesis explores the use of laser light interference detection characteristics of alumina films, experimental use of laser light interference experiment and plating film equipment and electrochemical measurement equipment to measure film thickness and electrochemical properties of alumina, and then measured according to experimental data to explore the effects of stress and strain, and corrosion resistance. Firstly, experimental steps plating film equipment after cleaning the aluminum layer of aluminum oxide film on the plating, the use of the principle of optical interference effects to measure the thickness of plating film. Using optical microscopy and atomic force microscope compare the surface morphology. Then use chemical testing instrument to test different thickness, more differences between the two; after the use of Newton''s ring experiment to observe the alumina films with different film thickness between the stress and strain. Another is to measure out the Tafel diagram and to further understand the effect of corrosion resistance of alumina films. Known by observation of alumina film thickness, when the electroplating voltage hours, the current density is concentrated, resulting in more uniform plating. On the contrary when the voltage is large, the current density is divergence, resulting in more uniform plating; last observed from the optical interference experiment, the greater the time when the thickness of the film has high corrosion resistance; the other hand when the thickness is smaller, its resistance to corrosion than low.