The Synthesis and Oxygen Plasma Treatment of AlSiN Thin film

• Main Authors: Han-Yuan Cheng, 鄭漢源
• Other Authors: 蔡丕椿
• Format: Others
• Language: zh-TW
• Published: 2010
• Online Access: http://ndltd.ncl.edu.tw/handle/e85493

碩士 === 國立虎尾科技大學 === 材料科學與綠色能源工程研究所 === 98 === There are two phases in this study. In phase one, Nano-composite Al-Si-N films have been deposited on Si wafer and cemented carbide substrates using Al1-xSix alloy targets with different Si contents by a reactive unbalanced magnetron sputtering system. The influences of Si contents of target on the microstructure and mechanical properties of the Al-Si-N films were investigated；In phase two, the effects of oxygen plasma treatment on the microstructure, mechanical and corrosion properties of the Al-Si-N films have been explored. In this study, films were characterized by using scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy, nanoindentation test and corrosion test. Results from SEM, XRD and XPS analysis indicate that the Al-Si-N thin films present a highly denser nanocomposite structure consisting of nano-crystalline AlN and amorphous Si3N4 in the film. However, the grain size decrease with the increase of the Si content, results in the higher hardness. In phase II, results of SEM and AFM showed that the surface roughness of films decreased from 27.3 nm to 15.8 nm after oxygen plasma treatment. XPS analyses indicated that a thin Al2O3 layer was formed on the top of films, the thickness of which was increased as the treatment time increased. The bonding conditions of films were also discussed in this study. The corrosion test revealed that the treated films perform a better corrosion resistance than the as-deposited film.