The Synthesis and Oxygen Plasma Treatment of AlSiN Thin film

碩士 === 國立虎尾科技大學 === 材料科學與綠色能源工程研究所 === 98 === There are two phases in this study. In phase one, Nano-composite Al-Si-N films have been deposited on Si wafer and cemented carbide substrates using Al1-xSix alloy targets with different Si contents by a reactive unbalanced magnetron sputtering system....

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Bibliographic Details
Main Authors: Han-Yuan Cheng, 鄭漢源
Other Authors: 蔡丕椿
Format: Others
Language:zh-TW
Published: 2010
Online Access:http://ndltd.ncl.edu.tw/handle/e85493